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Will work together to develop multiple E-beam lithography
January 18, 2010
By: DAVID SAVASTANO
Editor, Ink World Magazine
STMicroelectronics and CEA-Leti, the leading French semiconductor research institute, have signed an agreement for STMicroelectronics to join the new industry/research multi-partner program IMAGINE, led by CEA-Leti, which includes TSMC, for mask-less lithography for IC manufacturing. This three-year program is meant to allow companies to assess a maskless lithography infrastructure for IC manufacturing and the use of MAPPER Technology for high-throughput. The multiple e-beam lithography prog...
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